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Growth rate and microstructure of copper thin films deposited with metal-organic chemical vapor deposition from hexafluoroacetylacetonate copper(I) allyltrimethylsilane
Authors: Son, JH Park, MY Rhee, SW
Citation: Jh. Son et al., Growth rate and microstructure of copper thin films deposited with metal-organic chemical vapor deposition from hexafluoroacetylacetonate copper(I) allyltrimethylsilane, THIN SOL FI, 335(1-2), 1998, pp. 229-236
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