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Results: 1-7 |
Results: 7
Antioxidant benzoylated flavan-3-ol glycoside from Celastrus orbiculatus
Authors: Hwang, BY Kim, HS Lee, JH Hong, YS Ro, JS Lee, KS Lee, JJ
Citation: By. Hwang et al., Antioxidant benzoylated flavan-3-ol glycoside from Celastrus orbiculatus, J NAT PROD, 64(1), 2001, pp. 82-84
Kaurane diterpenes from Isodon japonicus inhibit nitric oxide and prostaglandin E-2 production and NF-kappa B activation in LPS-stimulated macrophageRAW264.7 cells
Authors: Hwang, BY Lee, JH Koo, TH Kim, HS Hong, YS Ro, JS Lee, KS Lee, JJ
Citation: By. Hwang et al., Kaurane diterpenes from Isodon japonicus inhibit nitric oxide and prostaglandin E-2 production and NF-kappa B activation in LPS-stimulated macrophageRAW264.7 cells, PLANTA MED, 67(5), 2001, pp. 406-410
Acetophenones from the roots of Cynanchum wilfordii H-EMSLEY
Authors: Hwang, BY Kim, YH Ro, JS Lee, KS Lee, JJ
Citation: By. Hwang et al., Acetophenones from the roots of Cynanchum wilfordii H-EMSLEY, ARCH PH RES, 22(1), 1999, pp. 72-74
Pregnane glycoside multidrug-resistance modulators from Cynanchum wilfordii
Authors: Hwang, BY Kim, SE Kim, YH Kim, HS Hong, YS Ro, JS Lee, KS Lee, JJ
Citation: By. Hwang et al., Pregnane glycoside multidrug-resistance modulators from Cynanchum wilfordii, J NAT PROD, 62(4), 1999, pp. 640-643
A study of buried layer formation using MeV ion implantation for the fabrication of ULSI CMOS devices
Authors: Ro, JS
Citation: Js. Ro, A study of buried layer formation using MeV ion implantation for the fabrication of ULSI CMOS devices, THIN SOL FI, 349(1-2), 1999, pp. 130-134
(-)-Epiafzelechin: Cyclooxygenase-1 inhibitor and anti-inflammatory agent from aerial parts of Celastrus orbiculatus
Authors: Min, KR Hwang, BY Lim, HS Kang, BS Oh, GJ Lee, J Kang, SH Lee, KS Ro, JS Kim, Y
Citation: Kr. Min et al., (-)-Epiafzelechin: Cyclooxygenase-1 inhibitor and anti-inflammatory agent from aerial parts of Celastrus orbiculatus, PLANTA MED, 65(5), 1999, pp. 460-462
A study on the defects in the fabrication of CMOS retrograded well including a buried layer using MeV ion implantation
Authors: Jang, YT Yoo, SH Ro, JS
Citation: Yt. Jang et al., A study on the defects in the fabrication of CMOS retrograded well including a buried layer using MeV ion implantation, J KOR PHYS, 33, 1998, pp. S239-S242
Risultati: 1-7 |