Authors:
Rosenbusch, A
Cui, Z
DiFabrizio, E
Gentili, M
Glezos, N
Meneghini, G
Nowotny, B
Patsis, G
Prewett, P
Raptis, I
Citation: A. Rosenbusch et al., Simulation of chemically amplified resist processes for 150 nm e-beam lithography, MICROEL ENG, 46(1-4), 1999, pp. 379-382
Authors:
Simecek, M
Rosenbusch, A
Ohta, T
Jinbo, H
Citation: M. Simecek et al., A new approach of e-beam proximity effect correction for high-resolution applications, JPN J A P 1, 37(12B), 1998, pp. 6774-6778