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Results: 1-9 |
Results: 9

Authors: Lee, J Rovira, PI An, I Collins, RW
Citation: J. Lee et al., Alignment and calibration of the MgF2 biplate compensator for applicationsin rotating-compensator multichannel ellipsometry, J OPT SOC A, 18(8), 2001, pp. 1980-1985

Authors: Fujiwara, H Koh, J Rovira, PI Collins, RW
Citation: H. Fujiwara et al., Assessment of effective-medium theories in the analysis of nucleation and microscopic surface roughness evolution for semiconductor thin films, PHYS REV B, 61(16), 2000, pp. 10832-10844

Authors: Collins, RW Koh, J Fujiwara, H Rovira, PI Ferlauto, AS Zapien, JA Wronski, CR Messier, R
Citation: Rw. Collins et al., Recent progress in thin film growth analysis by multichannel spectroscopicellipsometry, APPL SURF S, 154, 2000, pp. 217-228

Authors: Collins, RW Koh, J Ferlauto, AS Rovira, PI Lee, YH Koval, RJ Wronski, CR
Citation: Rw. Collins et al., Real time analysis of amorphous and microcrystalline silicon film growth by multichannel ellipsometry, THIN SOL FI, 364(1-2), 2000, pp. 129-137

Authors: Koh, J Ferlauto, AS Rovira, PI Koval, RJ Wronski, CR Collins, RW
Citation: J. Koh et al., Evolutionary phase diagrams for the deposition of silicon films from hydrogen-diluted silane, J NON-CRYST, 266, 2000, pp. 43-47

Authors: Ferlauto, AS Koh, J Rovira, PI Wronski, CR Collins, RW Ganguly, G
Citation: As. Ferlauto et al., Modeling the dielectric functions of silicon-based films in the amorphous,nanocrystalline and microcrystalline regimes, J NON-CRYST, 266, 2000, pp. 269-273

Authors: Rovira, PI Ferlauto, AS Koh, J Wronski, CR Collins, RW
Citation: Pi. Rovira et al., Optics of textured amorphous silicon surfaces, J NON-CRYST, 266, 2000, pp. 279-283

Authors: Rovira, PI Collins, RW
Citation: Pi. Rovira et Rw. Collins, Analysis of specular and textured SnO2 : F films by high speed four-parameter Stokes vector spectroscopy, J APPL PHYS, 85(4), 1999, pp. 2015-2025

Authors: Koh, J Ferlauto, AS Rovira, PI Wronski, CR Collins, RW
Citation: J. Koh et al., Evolutionary phase diagrams for plasma-enhanced chemical vapor deposition of silicon thin films from hydrogen-diluted silane, APPL PHYS L, 75(15), 1999, pp. 2286-2288
Risultati: 1-9 |