Results: 1-2 |
Results: 2
ELECTRON-BEAM BLOCK EXPOSURE SYSTEM FOR 256M DYNAMIC RANDOM-ACCESS MEMORY LITHOGRAPHY
Authors: SAKAMOTO K FUEKI S YAMAZAKI S ABE T KOBAYASHI K NISHINO H SATOH T TAKEMOTO A OOKURA A OHNO M SAGOH S OAE Y YAMADA A KAI J YASUDA H
Citation: K. Sakamoto et al., ELECTRON-BEAM BLOCK EXPOSURE SYSTEM FOR 256M DYNAMIC RANDOM-ACCESS MEMORY LITHOGRAPHY, JPN J A P 1, 32(12B), 1993, pp. 6006-6011
REPETITIVE ONE-10TH MICRON PATTERN FABRICATION USING AN EB BLOCK EXPOSURE SYSTEM
Authors: YAMADA A SAKAMOTO K YAMAZAKI S KOBAYASHI K SAGOH S OHNO M WATANABE H YASUDA H
Citation: A. Yamada et al., REPETITIVE ONE-10TH MICRON PATTERN FABRICATION USING AN EB BLOCK EXPOSURE SYSTEM, JPN J A P 1, 33(12B), 1994, pp. 6959-6965
Risultati: 1-2 |