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Results: 1-2 |
Results: 2
QUANTIFICATION OF METAL CONTAMINANTS ON GAAS WITH TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY
Authors: SCHRODEROEYNHAUSEN F BURKHARDT B FLADUNG T KOTTER F SCHNIEDERS A WIEDMANN L BENNINGHOVEN A
Citation: F. Schroderoeynhausen et al., QUANTIFICATION OF METAL CONTAMINANTS ON GAAS WITH TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1002-1006
QUANTIFICATION OF METAL TRACE CONTAMINANTS ON SI WAFER SURFACES BY LASER-SNMS AND TOF-SIMS USING SPUTTER-DEPOSITED SUBMONOLAYER STANDARDS
Authors: SCHNIEDERS A MOLLERS R TERHORST M CRAMER HG NIEHUIS E BENNINGHOVEN A
Citation: A. Schnieders et al., QUANTIFICATION OF METAL TRACE CONTAMINANTS ON SI WAFER SURFACES BY LASER-SNMS AND TOF-SIMS USING SPUTTER-DEPOSITED SUBMONOLAYER STANDARDS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2712-2724
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