Authors: VOIGT P SCHRAG G WACHUTKA G

Citation: P. Voigt et al., ELECTROFLUIDIC FULL-SYSTEM MODELING OF A FLAP VALVE MICROPUMP BASED ON KIRCHHOFFIAN NETWORK THEORY, Sensors and actuators. A, Physical, 66(1-3), 1998, pp. 9-14

Authors: SCHRAG G REBMANN M WURSTER C ZELLER F LASSMANN K EISENMENGER W

Citation: G. Schrag et al., INVESTIGATION OF PRECIPITATION IN CZOCHRALSKI SILICON BY PHONON SPECTROSCOPY, Physica status solidi. a, Applied research, 168(1), 1998, pp. 37-48

Authors: VOIGT P SCHRAG G WACHUTKA G

Citation: P. Voigt et al., MICROFLUIDIC SYSTEM MODELING USING VHDL-AMS AND CIRCUIT SIMULATION, Microelectronics, 29(11), 1998, pp. 791-797

Authors: ENSINGER W VOLZ K SCHRAG G STRITZKER B RAUSCHENBACH B

Citation: W. Ensinger et al., FORMATION OF SILICON-NITRIDE LAYERS BY NITROGEN ION IRRADIATION OF SILICON BIASED TO A HIGH-VOLTAGE IN AN ELECTRON-CYCLOTRON-RESONANCE MICROWAVE PLASMA, Applied physics letters, 72(10), 1998, pp. 1164-1166

Authors: HOCHBAUER T ENSINGER W SCHRAG G HARTMANN J STRITZKER B RAUSCHENBACH B

Citation: T. Hochbauer et al., HOMOGENEITY MEASUREMENTS OF PLASMA IMMERSION ION-IMPLANTED COMPLEX-SHAPED SAMPLES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 869-872

Authors: KONIGER A ENSINGER W HAMMERL C HOCHBAUER T SCHRAG G HARTMANN J THOMAE RW BENDER H STRITZKER B RAUSCHENBACH B

Citation: A. Koniger et al., INVESTIGATION OF PLASMA IMMERSION ION-IMPLANTED NIOBIUM OXIDE AND TITANIUM NITRIDE FILMS BY NANOHARDNESS MEASUREMENT, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 120(1-4), 1996, pp. 282-285