Authors: JORDAN M SCHUCH A RIGHINI R SIGNORINI GF JODL HJ

Citation: M. Jordan et al., PHONON RELAXATION PROCESSES IN CRYSTALS (NANO3) AT HIGH-PRESSURE AND LOW-TEMPERATURE, The Journal of chemical physics, 101(5), 1994, pp. 3436-3443

Authors: KULICKE UM DUHM L SCHUCH A

Citation: Um. Kulicke et al., DETECTION AND PREDICTION OF FILAMENT DRAW ING BEHAVIOR OF FILLED ADHESIVES BY RHEOLOGICAL MEASUREMENTS, Chemieingenieurtechnik, 66(12), 1994, pp. 1643-1646