Authors: CHU PK SCHUELER BW REICH F LINDLEY PM

Citation: Pk. Chu et al., DETERMINATION OF TRACE METALLIC IMPURITIES ON 200-MM SILICON-WAFERS BY TIME-OF-FLIGHT SECONDARY-ION-MASS SPECTROSCOPY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 1908-1912

Authors: CHILDS KD NARUM D LAVANIER LA LINDLEY PM SCHUELER BW MULHOLLAND G DIEBOLD AC

Citation: Kd. Childs et al., COMPARISON OF SUBMICRON PARTICLE ANALYSIS BY AUGER-ELECTRON SPECTROSCOPY, TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY, AND SECONDARY-ELECTRON MICROSCOPY WITH ENERGY-DISPERSIVE X-RAY SPECTROSCOPY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2392-2404