Authors: LOBODA MJ SEIFFERLY JA

Citation: Mj. Loboda et Ja. Seifferly, CHEMICAL INFLUENCE OF INERT-GAS ON THE THIN-FILM STRESS IN PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITED ALPHA-SIN-H FILMS, Journal of materials research, 11(2), 1996, pp. 391-398

Authors: LOBODA MJ SEIFFERLY JA DALL FC

Citation: Mj. Loboda et al., PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF A-SIC-H FILMS FROM ORGANOSILICON PRECURSORS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(1), 1994, pp. 90-96