Authors: ARIAS LJ SELBREDE SC WEISE MT CARL DA

Citation: Lj. Arias et al., CHARACTERIZATION OF A LOW-TEMPERATURE, LOW-PRESSURE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION TETRAETHYLORTHOSILICATE OXIDE DEPOSITION PROCESS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1389-1393

Authors: WEISE MT SELBREDE SC ARIAS LJ CARL D

Citation: Mt. Weise et al., CHARACTERIZATION OF FLUORINATED TETRA ETHYL ORTHO SILICATE OXIDE-FILMS DEPOSITED IN A LOW-PRESSURE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1399-1402