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Results: 1-25/28
Authors:
KAWASAKI H
SAKAMOTO K
MAEDA S
FUKUZAWA T
SHIRATANI M
WATANABE Y
Citation: H. Kawasaki et al., TRANSITION OF PARTICLE GROWTH REGION IN SIH4 RF DISCHARGES, JPN J A P 1, 37(10), 1998, pp. 5757-5762
Authors:
KAWASAKI H
KIDA J
SAKAMOTO K
FUKUZAWA T
SHIRATANI M
WATANABE Y
Citation: H. Kawasaki et al., SIMILARITIES IN SPATIAL DISTRIBUTIONS OF ABSOLUTE GEH2 DENSITY, RADICAL PRODUCTION-RATE AND PARTICLE AMOUNT IN GEH4 RF DISCHARGES, JPN J A P 2, 37(4B), 1998, pp. 475-477
Authors:
KAWASAKI H
SAKAMOTO K
MAEDA S
FUKUZAWA T
SHIRATANI M
WATANABE Y
Citation: H. Kawasaki et al., STUDY ON INITIAL GROWTH OF PARTICLES IN LOW-PRESSURE AND LOW-POURER GEH4 RF DISCHARGES USING THE HIGH-SENSITIVITY PHOTON-COUNTING LASER-LIGHT-SCATTERING METHOD, JPN J A P 2, 37(10B), 1998, pp. 1264-1267
Authors:
PERRIN J
SHIRATANI M
KAENUNE P
VIDELOT H
JOLLY J
GUILLON J
Citation: J. Perrin et al., SURFACE-REACTION PROBABILITIES AND KINETICS OF H, SIH3, SI2H5, CH3, AND C2H5 DURING DEPOSITION OF A-SI-H AND A-C-H FROM H-2, SIH4, AND CH2 DISCHARGES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(1), 1998, pp. 278-289
Authors:
SHIRATANI M
KAWASAKI H
FUKUZAWA T
WATANABE Y
YAMAMOTO Y
SUGANUMA S
HORI M
GOTO T
Citation: M. Shiratani et al., A STUDY ON THE TIME EVOLUTION OF SIH3 SURFACE LOSS PROBABILITY ON HYDROGENATED AMORPHOUS-SILICON FILMS IN SIH4 RF DISCHARGES USING INFRAREDDIODE-LASER ABSORPTION-SPECTROSCOPY, Journal of physics. D, Applied physics, 31(7), 1998, pp. 776-780
Authors:
KAWASAKI H
KIDA J
SAKAMOTO K
FUKUZAWA T
SHIRATANI M
WATANABE Y
Citation: H. Kawasaki et al., STUDY ON GROWTH-PROCESSES OF PARTICLES IN GERMANE RADIO-FREQUENCY DISCHARGES USING LASER-LIGHT SCATTERING AND SCANNING ELECTRON-MICROSCOPICMETHODS, Journal of applied physics, 83(11), 1998, pp. 5665-5669
Authors:
SHIRATANI M
JOLLY J
VIDELOT H
PERRIN J
Citation: M. Shiratani et al., SURFACE-REACTION KINETICS OF CH3 IN CH4 RF DISCHARGE STUDIED BY TIME-RESOLVED THRESHOLD IONIZATION MASS-SPECTROMETRY, JPN J A P 1, 36(7B), 1997, pp. 4752-4755
Authors:
KAWASAKI H
OHKURA H
FUKUZAWA T
SHIRATANI M
WATANABE Y
YAMAMOTO Y
SUGANUMA S
HORI M
GOTO T
Citation: H. Kawasaki et al., ROLES OF SIH3 AND SIH2 RADICALS IN PARTICLE GROWTH IN RF SILANE PLASMAS, JPN J A P 1, 36(7B), 1997, pp. 4985-4988
Authors:
OUCHI T
NOZAKI T
OKAMOTO Y
SHIRATANI M
OHYA Y
Citation: T. Ouchi et al., SYNTHESIS AND ENZYMATIC-HYDROLYSIS OF POLYDEPSIPEPTIDES WITH FUNCTIONALIZED PENDANT GROUPS, Macromolecular chemistry and physics, 197(6), 1996, pp. 1823-1833
Authors:
WATANABE Y
SHIRATANI M
FUKUZAWA T
KAWASAKI H
UEDA Y
SINGH S
OHKURA H
Citation: Y. Watanabe et al., CONTRIBUTION OF SHORT LIFETIME RADICALS TO THE GROWTH OF PARTICLES INSIH4 HIGH-FREQUENCY DISCHARGES AND THE EFFECTS OF PARTICLES ON DEPOSITED FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 995-1001
Authors:
WATANABE Y
SHIRATANI M
KAWASAKI H
SINGH S
FUKUZAWA T
UEDA Y
OHKURA H
Citation: Y. Watanabe et al., GROWTH-PROCESSES OF PARTICLES IN HIGH-FREQUENCY SILANE PLASMAS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 540-545
Authors:
SHIRATANI M
KAWASAKI H
FUKUZAWA T
WATANABE Y
Citation: M. Shiratani et al., IN-SITU POLARIZATION-SENSITIVE LASER-LIGHT-SCATTERING METHOD FOR SIMULTANEOUS MEASUREMENTS OF 2-DIMENSIONAL SPATIAL SIZE AND DENSITY DISTRIBUTIONS OF PARTICLES IN PLASMAS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(2), 1996, pp. 603-607
Authors:
SHIRATANI M
KAWASAKI H
FUKUZAWA T
WATANABE Y
Citation: M. Shiratani et al., PRODUCTION OF SIZE-CONTROLLED SI FINE PARTICLES USING PULSED RF DISCHARGE, Surface review and letters, 3(1), 1996, pp. 75-78
Authors:
SHIRATANI M
KISHIGAKI N
KAWASAKI H
FUKUZAWA T
WATANABE Y
Citation: M. Shiratani et al., 2-DIMENSIONAL SPATIAL PROFILES OF SIZE AND DENSITY OF PARTICULATES GROWN IN RF SILANE PLASMAS, IEEE transactions on plasma science, 24(1), 1996, pp. 99-100
Authors:
SHIRATANI M
KAWASAKI H
FUKUZAWA T
KINOSHITA T
WATANABE Y
Citation: M. Shiratani et al., DIAGNOSTICS OF PLASMA FOR METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION OF CU AND FABRICATION OF CU THIN-FILMS USING THE PLASMA, Journal of physics. D, Applied physics, 29(11), 1996, pp. 2754-2758
Authors:
FUKUZAWA T
OBATA K
KAWASAKI H
SHIRATANI M
WATANABE Y
Citation: T. Fukuzawa et al., DETECTION OF PARTICLES IN RF SILANE PLASMAS USING PHOTOEMISSION METHOD, Journal of applied physics, 80(6), 1996, pp. 3202-3207
Authors:
SHIRATANI M
KAWASAKI H
FUKUZAWA T
YOSHIOKA T
UEDA Y
SINGH S
WATANABE Y
Citation: M. Shiratani et al., SIMULTANEOUS IN-SITU MEASUREMENTS OF PROPERTIES OF PARTICULATES IN RFSILANE PLASMAS USING A POLARIZATION-SENSITIVE LASER-LIGHT-SCATTERING METHOD, Journal of applied physics, 79(1), 1996, pp. 104-109
Authors:
KAWASAKI H
UEDA Y
YOSHIOKA T
FUKUZAWA T
SHIRATANI M
WATANABE Y
Citation: H. Kawasaki et al., DISCHARGE FREQUENCY-DEPENDENCE OF PARTICULATE GROWTH IN HIGH-FREQUENCY SILANE PLASMAS, Applied physics letters, 67(26), 1995, pp. 3880-3882
Authors:
KAWASAKI H
FUKUZAWA T
TSURUOKA H
YOSHIOKA T
SHIRATANI M
WATANABE Y
Citation: H. Kawasaki et al., INVESTIGATION OF PARTICULATE GROWTH-PROCESSES IN RF SILANE PLASMAS USING LIGHT-ABSORPTION AND SCANNING ELECTRON-MICROSCOPIC METHODS, JPN J A P 1, 33(7B), 1994, pp. 4198-4201
Authors:
FUKUZAWA T
KAWASAKI H
SHIRATANI M
WATANABE Y
Citation: T. Fukuzawa et al., STUDY ON GROWTH-PROCESSES OF SUBNANOMETER PARTICLES IN EARLY PHASE OFSILANE RF DISCHARGE, JPN J A P 1, 33(7B), 1994, pp. 4212-4215
Authors:
SATO N
SHIRATANI M
WATANABE Y
Citation: N. Sato et al., MODELING OF PARTICLE GROWTH IN RF SILANE-HELIUM PLASMA, JPN J A P 1, 33(7B), 1994, pp. 4266-4270
Authors:
SHIRATANI M
FUKUZAWA T
WATANABE Y
Citation: M. Shiratani et al., FORMATION PROCESSES OF PARTICULATES IN HELIUM-DILUTED SILANE RF PLASMAS, IEEE transactions on plasma science, 22(2), 1994, pp. 103-109
Authors:
OHYA Y
SHIRATANI M
KOBAYASHI H
OUCHI T
Citation: Y. Ohya et al., RELEASE BEHAVIOR OF 5-FLUOROURACIL FROM CHITOSAN-GEL NANOSPHERES IMMOBILIZING 5-FLUOROURACIL COATED WITH POLYSACCHARIDES AND THEIR CELL-SPECIFIC CYTOTOXICITY, Pure and applied chemistry, A31(5), 1994, pp. 629-642
Authors:
SHIRATANI M
KAWASAKI H
FUKUZAA T
TSURUOKA H
YOSHIOKA T
WATANABE Y
Citation: M. Shiratani et al., STUDY ON GROWTH-PROCESSES OF PARTICULATES IN HELIUM-DILUTED SILANE RFPLASMAS USING SCANNING ELECTRON-MICROSCOPY, Applied physics letters, 65(15), 1994, pp. 1900-1902
Authors:
FUKUZAWA T
SHIRATANI M
WATANABE Y
Citation: T. Fukuzawa et al., NOVEL IN-SITU METHOD TO DETECT SUBNANOMETER-SIZED PARTICLES IN PLASMAS AND ITS APPLICATION TO PARTICLES IN HELIUM-DILUTED SILANE RADIO-FREQUENCY PLASMAS, Applied physics letters, 64(23), 1994, pp. 3098-3100