Authors: LAI YL CHANG EY CHANG CY YANG HPD NAKAMURA K SHY SL

Citation: Yl. Lai et al., A SIMPLE FABRICATION PROCESS OF T-SHAPED GATES USING A DEEP-UV ELECTRON-BEAM/DEEP-UV TRI-LAYER RESIST SYSTEM AND ELECTRON-BEAM LITHOGRAPHY/, JPN J A P 1, 35(12B), 1996, pp. 6440-6446

Authors: LOONG WA SHY SL LIN YC

Citation: Wa. Loong et al., 0.35-MU-M PATTERN FABRICATION USING QUARTZ-ETCH ATTENUATE PHASE-SHIFTING MASK IN AN I-LINE STEPPER WITH A 0.50-NA AND A 0.60-SIGMA, Microelectronic engineering, 27(1-4), 1995, pp. 275-278

Authors: NAKAMURA K SHY SL TUO CC HUANG CC

Citation: K. Nakamura et al., CRITICAL DIMENSION CONTROL OF POLY-BUTENE-SULFONE RESIST IN ELECTRON-BEAM LITHOGRAPHY, JPN J A P 1, 33(12B), 1994, pp. 6989-6992

Authors: LOONG WA SHY SL GUO GC YANG MT SU SY

Citation: Wa. Loong et al., CROSS SHAPED PATTERN ON CHROME MASK FOR 0.5 MU-M CONTACT HOLE FABRICATION, Microelectronic engineering, 23(1-4), 1994, pp. 175-178