Authors: SCHRODER H OBERMEIER E STECKENBORN A

Citation: H. Schroder et al., EFFECTS OF THE ETCHMASK PROPERTIES ON THE ANISOTROPY RATIO IN ANISOTROPIC ETCHING OF (100)SILICON IN AQUEOUS KOH, Journal of micromechanics and microengineering, 8(2), 1998, pp. 99-103