Authors: SMITH TH BONING DS STEFANI J BUTLER SW

Citation: Th. Smith et al., RUN BY RUN ADVANCED PROCESS-CONTROL OF METAL SPUTTER-DEPOSITION, IEEE transactions on semiconductor manufacturing, 11(2), 1998, pp. 276-284

Authors: STEFANI J LOEWENSTEIN LM SULLIVAN M

Citation: J. Stefani et al., ONLINE DIAGNOSTIC MONITORING OF PHOTORESIST ASHING, IEEE transactions on semiconductor manufacturing, 8(1), 1995, pp. 2-9

Authors: BUTLER SW STEFANI J SULLIVAN M MAUNG S BARNA G HENCK S

Citation: Sw. Butler et al., INTELLIGENT MODEL-BASED CONTROL-SYSTEM EMPLOYING IN-SITU ELLIPSOMETRY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1984-1991

Authors: STEFANI J BUTLER SW

Citation: J. Stefani et Sw. Butler, ONLINE INFERENCE OF PLASMA ETCH UNIFORMITY USING IN-SITU ELLIPSOMETRY, Journal of the Electrochemical Society, 141(5), 1994, pp. 1387-1391