Authors: MATYI RJ FELCH SB LEE BS STRATHMAN MR KEENAN JA GUO Y WANG L

Citation: Rj. Matyi et al., PROCESS EFFECTS IN SHALLOW JUNCTION FORMATION BY PLASMA DOPING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(1), 1998, pp. 435-439