Authors:
MATYI RJ
FELCH SB
LEE BS
STRATHMAN MR
KEENAN JA
GUO Y
WANG L
Citation: Rj. Matyi et al., PROCESS EFFECTS IN SHALLOW JUNCTION FORMATION BY PLASMA DOPING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(1), 1998, pp. 435-439