Authors: STUMBO DP WOLFE JC

Citation: Dp. Stumbo et Jc. Wolfe, CONTRAST OF ION-BEAM PROXIMITY PRINTING WITH NONIDEAL MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3539-3542

Authors: STUMBO DP WOLFE JC

Citation: Dp. Stumbo et Jc. Wolfe, ION EXPOSURE CHARACTERIZATION OF A CHEMICALLY AMPLIFIED EPOXY RESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2432-2435