Authors: Sali, JV Patil, SB Jadkar, SR Takwale, MG

Citation: Jv. Sali et al., Hot-wire CVD growth simulation for thickness uniformity, THIN SOL FI, 395(1-2), 2001, pp. 66-70

Authors: Jadkar, SR Sali, JV Takwale, MG Musale, DV Kshirsagar, ST

Citation: Sr. Jadkar et al., The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon (mu c-Si : H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique, THIN SOL FI, 395(1-2), 2001, pp. 206-212

Authors: Jadkar, SR Sali, JV Takwale, MG Musale, DV Kshirsagar, ST

Citation: Sr. Jadkar et al., Synthesis of highly conductive boron-doped p-type hydrogenated microcrystalline silicon (mu c-Si : H)by a hot-wire chemical vapor deposition (HWCVD) technique, SOL EN MAT, 64(4), 2000, pp. 333-346

Authors: Rashad, A Sali, JV Marathe, BR Takwale, MG Shaligram, AD

Citation: A. Rashad et al., The effect of substrate temperature on P-CVD deposited a-SiGe : H films, SOL EN MAT, 57(3), 1999, pp. 209-216