Authors:
Hallik, A
Alumaa, A
Sammelselg, V
Tamm, J
Citation: A. Hallik et al., A comparison of redox processes for polypyrrole/dodecylsulfate films in aqueous and non-aqueous media, J SOL ST EL, 5(4), 2001, pp. 265-273
Authors:
Merivee, E
Ploomi, A
Luik, A
Rahi, M
Sammelselg, V
Citation: E. Merivee et al., Antennal sensilla of the ground beetle Platynus dorsalis (Pontoppidan, 1763) (Coleoptera, carabidae), MICROSC RES, 55(5), 2001, pp. 339-349
Authors:
Saal, K
Sammelselg, V
Lohmus, A
Lohmus, R
Kuusk, E
Raidaru, G
Rinken, T
Rinken, A
Citation: K. Saal et al., AFM characterization of enzyme immobilisation onto glass and mica - Problems and perspectives, PHYS LOW-D, 3-4, 2001, pp. 151-157
Authors:
Tarre, A
Rosental, A
Sammelselg, V
Uustare, T
Citation: A. Tarre et al., Comparative study of low-temperature chloride atomic-layer chemical vapor deposition of TiO2 and SnO2, APPL SURF S, 175, 2001, pp. 111-116
Authors:
Aarik, J
Aidla, A
Sammelselg, V
Uustare, T
Ritala, M
Leskela, M
Citation: J. Aarik et al., Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water, THIN SOL FI, 370(1-2), 2000, pp. 163-172
Authors:
Aarik, J
Aidla, A
Mandar, H
Sammelselg, V
Uustare, T
Citation: J. Aarik et al., Texture development in nanocrystalline hafnium dioxide thin films grown byatomic layer deposition, J CRYST GR, 220(1-2), 2000, pp. 105-113
Citation: E. Lust et al., Influence of charge density and electrolyte concentration on the electrical double layer characteristics at rough cadmium electrodes, ELECTR ACT, 46(2-3), 2000, pp. 185-191
Authors:
Sammelselg, V
Aarik, J
Aidla, A
Kasikov, A
Heikinheimo, E
Peussa, M
Niinisto, L
Citation: V. Sammelselg et al., Composition and thickness determination of thin oxide films: comparison ofdifferent programs and methods, J ANAL ATOM, 14(3), 1999, pp. 523-527
Authors:
Aarik, J
Aidla, A
Kiisler, AA
Uustare, T
Sammelselg, V
Citation: J. Aarik et al., Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films, THIN SOL FI, 340(1-2), 1999, pp. 110-116