Authors: Vereecke, G Schaekers, M Verstraete, K Arnauts, S Heyns, MM Plante, W

Citation: G. Vereecke et al., Quantitative analysis of trace metals in silicon nitride films by a vapor phase decomposition/solution collection approach, J ELCHEM SO, 147(4), 2000, pp. 1499-1501

Authors: Zhang, F de Beeck, MO Schaekers, M Ronse, K Conley, W Gopalan, P Gangala, H Dusa, M Bendik, J

Citation: F. Zhang et al., CD control using SiONBARL processing for sub-0.25 mu m lithography, MICROEL ENG, 46(1-4), 1999, pp. 51-54

Authors: Heyns, MM Bearda, T Cornelissen, I De Gendt, S Degraeve, R Groeseneken, G Kenens, C Knotter, DM Loewenstein, LM Mertens, PW Mertens, S Meuris, M Nigam, T Schaekers, M Teerlinck, I Vandervorst, W Vos, R Wolke, K

Citation: Mm. Heyns et al., Cost-effective cleaning and high-quality thin gate oxides, IBM J RES, 43(3), 1999, pp. 339-350