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Results: 1-1 |
Results: 1
Effects of radio frequency bias frequency and radio frequency bias pulsingon SiO2 feature etching in inductively coupled fluorocarbon plasmas
Authors: Schaepkens, N Oehrlein, GS Cook, JM
Citation: N. Schaepkens et al., Effects of radio frequency bias frequency and radio frequency bias pulsingon SiO2 feature etching in inductively coupled fluorocarbon plasmas, J VAC SCI B, 18(2), 2000, pp. 856-863
Risultati: 1-1 |