Authors: Schroeder, TW Ma, PF Lam, AM Zheng, YJ Engstrom, JR

Citation: Tw. Schroeder et al., Selective Si epitaxial growth technique employing atomic hydrogen and substrate temperature modulation, APPL PHYS L, 79(14), 2001, pp. 2181-2183

Authors: Lee, D Blakely, JM Schroeder, TW Engstrom, JR

Citation: D. Lee et al., A growth method for creating arrays of atomically flat mesas on silicon, APPL PHYS L, 78(10), 2001, pp. 1349-1351