Authors:
Scopel, WL
Cuzinatto, RR
Tabacniks, MH
Fantini, MCA
Alayo, MI
Pereyra, I
Citation: Wl. Scopel et al., Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition, J NON-CRYST, 288(1-3), 2001, pp. 88-95