Authors:
Tee, KC
Prasad, K
Lee, CS
Gong, H
Cha, CL
Chan, L
See, AK
Citation: Kc. Tee et al., Effects of deliberate copper contamination from the plating solution on the electrical characteristics of MOSFETs, IEEE SEMIC, 14(2), 2001, pp. 170-172
Citation: Cl. Cha et al., Photoresist patterning and ion implantation degradation effects on flash memory device yield, EL SOLID ST, 3(7), 2000, pp. 340-342
Authors:
Chen, SY
Shen, ZX
Chen, ZD
Chan, LH
See, AK
Citation: Sy. Chen et al., Laser-induced direct formation of C54TiSi(2) films with fine grains on c-Si substrates, APPL PHYS L, 75(12), 1999, pp. 1727-1729