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Results: 1-6 |
Results: 6

Authors: Tee, KC Prasad, K Lee, CS Gong, H Cha, CL Chan, L See, AK
Citation: Kc. Tee et al., Effects of deliberate copper contamination from the plating solution on the electrical characteristics of MOSFETs, IEEE SEMIC, 14(2), 2001, pp. 170-172

Authors: Chen, SY Shen, ZX See, AK Chan, LH
Citation: Sy. Chen et al., Enhancement effect of C40TiSi(2) on the C54 phase formation, J ELCHEM SO, 148(12), 2001, pp. G734-G737

Authors: Cha, CL Ngo, Q Chor, EF See, AK Lee, TJ
Citation: Cl. Cha et al., Photoresist patterning and ion implantation degradation effects on flash memory device yield, EL SOLID ST, 3(7), 2000, pp. 340-342

Authors: Chen, SY Shen, ZX Li, K See, AK Chan, LH
Citation: Sy. Chen et al., Synthesis and characterization of pure C40TiSi(2), APPL PHYS L, 77(26), 2000, pp. 4395-4397

Authors: Chen, SY Shen, ZX Chen, ZD See, AK Chan, LH Zhang, TJ Tee, KC
Citation: Sy. Chen et al., Laser-induced formation of titanium silicides, SURF INT AN, 28(1), 1999, pp. 200-203

Authors: Chen, SY Shen, ZX Chen, ZD Chan, LH See, AK
Citation: Sy. Chen et al., Laser-induced direct formation of C54TiSi(2) films with fine grains on c-Si substrates, APPL PHYS L, 75(12), 1999, pp. 1727-1729
Risultati: 1-6 |