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Results:
1-9
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Results: 9
Authors:
Ahn, SH
An, S
Aoki, A
Berns, HG
Bhang, HC
Boyd, S
Casper, D
Chikamatsu, T
Choi, JH
Echigo, S
Etoh, M
Fujii, K
Fukuda, S
Fukuda, Y
Gajewski, W
Golebiewska, U
Hara, T
Hasegawa, T
Hayato, Y
Hill, J
Hong, SJ
Ieiri, M
Inada, T
Inagaki, T
Ishida, T
Ishii, H
Ishii, T
Ishino, H
Ishitsuka, M
Itow, Y
Iwashita, T
Jang, HI
Jang, JS
Jeon, EJ
Jeong, EM
Jung, CK
Kadowaki, T
Kajita, T
Kameda, J
Kaneyuki, K
Kato, I
Kato, Y
Kearns, E
Kenmochi, S
Khang, BH
Kibayashi, A
Kielczewska, D
Kim, BJ
Kim, CO
Kim, HI
Kim, JH
Kim, JY
Kim, SB
Kishi, S
Kitamura, M
Kobayashi, K
Kobayashi, T
Kobayashi, Y
Kohama, M
Koo, DG
Koshio, Y
Kropp, W
Kume, G
Kusano, E
Learned, JG
Lee, HK
Lee, JW
Lee, SB
Lim, IT
Lim, SH
Maesaka, H
Martens, K
Maruyama, T
Matsuno, S
Mauger, C
McGrew, C
Minakawa, M
Mine, S
Miura, M
Miyamoto, S
Miyano, K
Moriyama, S
Mukai, S
Nakahata, M
Nakamura, K
Nakamura, M
Nakano, I
Nakaya, T
Nakayama, S
Nakayoshi, K
Nishijima, K
Nishikawa, K
Nishiyama, S
Noda, S
Noumi, H
Obayashi, Y
Oh, JK
Okada, A
Onchi, M
Otaki, T
Oyama, Y
Pac, MY
Park, H
Park, SH
Park, SK
Sakai, A
Sakuda, M
Sakurai, N
Sasao, N
Sato, K
Scholberg, K
Seo, E
Sharkey, E
Shiino, K
Shima, A
Shiozawa, M
So, H
Sobel, H
Stachyra, A
Stone, JL
Sulak, LR
Suzuki, A
Suzuki, Y
Suzuki, Y
Takasaki, M
Takatsuki, M
Takenaka, K
Takeuchi, H
Takeuchi, Y
Tamura, N
Tanaka, KH
Tanaka, Y
Tashiro, K
Tauchi, K
Toshito, T
Totsuka, Y
Tumakov, V
Umeda, T
Vagins, M
Walter, CW
Wilkes, RJ
Yamada, S
Yamaguchi, T
Yamanoi, Y
Yanagisawa, C
Yokoyama, H
Yokoyama, H
Yoo, J
Yoshida, M
You, SY
Citation: Sh. Ahn et al., Detection of accelerator-produced neutrinos at a distance of 250 km, PHYS LETT B, 511(2-4), 2001, pp. 178-184
Authors:
Seo, E
Kim, O
Citation: E. Seo et O. Kim, Dose and shape modification proximity effect correction for forward-scattering range scale features in electron beam lithography, JPN J A P 1, 39(12B), 2000, pp. 6827-6830
Authors:
Seo, E
Choi, BK
Kim, O
Citation: E. Seo et al., Determination of proximity effect parameters and the shape bias parameter in electron beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 305-308
Authors:
Koh, M
Egusa, K
Furumoto, H
Shirakata, T
Seo, E
Shibahara, K
Yokoyama, S
Hirose, M
Citation: M. Koh et al., Quantitative evaluation of dopant loss in 5-10 keV as ion implantation forlow-resistive, ultrashallow source/drain formation, JPN J A P 1, 38(4B), 1999, pp. 2324-2328
Authors:
Seo, E
Bhang, H
Park, H
Kim, JH
Kang, BH
Citation: E. Seo et al., A new absolute calibration method for a broad range of light intensities, J KOR PHYS, 35(3), 1999, pp. 258-264
Authors:
Park, SH
Lee, C
Park, H
Kim, JH
Ha, JH
Seo, E
Kim, JS
Bhang, H
Kim, JC
Kim, YD
Lee, JH
Kwon, YK
Lee, CS
Chang, JH
Lee, HY
Shin, SA
Chai, JS
Kim, YS
Yoo, KH
Citation: Sh. Park et al., Csl(Tl) scintillator telescope measurement of charged particles extracted from the KCCH MC-50 cyclotron, J KOR PHYS, 35(1), 1999, pp. 16-20
Authors:
Seo, Y
Lee, K
Yi, M
Seo, E
Choi, BK
Kim, O
Raptis, I
Argitis, P
Hatzakis, M
Citation: Y. Seo et al., Evaluation of advanced epoxy novolac resist, EPR, for sub 100nm synchrotron x-ray proximity lithography, MICROEL ENG, 46(1-4), 1999, pp. 461-464
Authors:
Yi, M
Seo, E
Seo, Y
Lee, K
Kim, O
Citation: M. Yi et al., Characterization of proximity correction in 100-nm-regime X-ray lithography, JPN J A P 1, 37(12B), 1998, pp. 6824-6829
Authors:
Yi, M
Seo, Y
Seo, E
Yang, J
Lee, K
Choi, BK
Kim, O
Citation: M. Yi et al., Characterization of pattern geometrical effect on line end shortening in x-ray lithography, J VAC SCI B, 16(6), 1998, pp. 3515-3520
Risultati:
1-9
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