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Results: 1
Stress behavior of high density plasma chemical vapor deposition oxide deposited on a metal-patterned wafer
Authors:
Lee, SG Park, JW Kim, M Kim, SR Seo, TW Chung, UI Kang, GW
Citation:
Sg. Lee et al., Stress behavior of high density plasma chemical vapor deposition oxide deposited on a metal-patterned wafer, JPN J A P 1, 37(12B), 1998, pp. 6965-6969
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