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Results: 1-7 |
Results: 7
Mechanism of the film composition formation during magnetron sputtering ofWTi
Authors: Shaginyan, LR Misina, M Kadlec, S Jastrabik, L Mackova, A Perina, V
Citation: Lr. Shaginyan et al., Mechanism of the film composition formation during magnetron sputtering ofWTi, J VAC SCI A, 19(5), 2001, pp. 2554-2566
Energy resolved ion mass spectroscopy of the plasma during CV reactive magnetron sputtering
Authors: Misina, M Shaginyan, LR Macek, M Panjan, P
Citation: M. Misina et al., Energy resolved ion mass spectroscopy of the plasma during CV reactive magnetron sputtering, SURF COAT, 142, 2001, pp. 348-354
Influence of different physical factors on microstructure and properties of magnetron sputtered amorphous carbon films
Authors: Shaginyan, LR Onoprienko, AA Britun, VF Smirnov, VP
Citation: Lr. Shaginyan et al., Influence of different physical factors on microstructure and properties of magnetron sputtered amorphous carbon films, THIN SOL FI, 397(1-2), 2001, pp. 288-295
Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering
Authors: Jastrabik, L Soukup, L Shaginyan, LR Onoprienko, AA
Citation: L. Jastrabik et al., Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering, SURF COAT, 123(2-3), 2000, pp. 261-267
CNxHy films obtained by ECR plasma activated CVD: The role of substrate bias (DC, RF) and some other deposition parameters in growth mechanisms
Authors: Shaginyan, LR Fendrych, F Jastrabik, L Soukup, L Kulikovsky, VY Musil, J
Citation: Lr. Shaginyan et al., CNxHy films obtained by ECR plasma activated CVD: The role of substrate bias (DC, RF) and some other deposition parameters in growth mechanisms, SURF COAT, 119, 1999, pp. 65-73
Role of ion bombardment in forming CNx and CNxHy films deposited by r.f.-magnetron reactive sputtering and ECR plasma-activated CVD methods
Authors: Shaginyan, LR Onoprienko, AA Vereschaka, VM Fendrych, F Vysotsky, VG
Citation: Lr. Shaginyan et al., Role of ion bombardment in forming CNx and CNxHy films deposited by r.f.-magnetron reactive sputtering and ECR plasma-activated CVD methods, SURF COAT, 113(1-2), 1999, pp. 134-139
Methods of production, structure, and properties of film materials based on the carbon-nitrogen system (survey)
Authors: Shaginyan, LR
Citation: Lr. Shaginyan, Methods of production, structure, and properties of film materials based on the carbon-nitrogen system (survey), POWD MET ME, 37(11-12), 1998, pp. 648-658
Risultati: 1-7 |