Authors: Cole, DA Shallenberger, JR Novak, SW Moore, RL Edgell, MJ Smith, SP Hitzman, CJ Kirchhoff, JF Principe, E Nieveen, W Huang, FK Biswas, S Bleiler, RJ Jones, K

Citation: Da. Cole et al., SiO2 thickness determination by x-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry, J VAC SCI B, 18(1), 2000, pp. 440-444

Authors: Shallenberger, JR Cole, DA Novak, SW

Citation: Jr. Shallenberger et al., Characterization of silicon oxynitride thin films by x-ray photoelectron spectroscopy, J VAC SCI A, 17(4), 1999, pp. 1086-1090