Authors: Yang, CS Oh, KS Ryu, JY Kim, DC Shou-Yong, J Choi, CK Lee, HJ Um, SH Chang, HY

Citation: Cs. Yang et al., A study on the formation and characteristics of the Si-O-C-H composite thin films with low dielectric constant for advanced semiconductor devices, THIN SOL FI, 390(1-2), 2001, pp. 113-118