Authors: Raoux, S Tanaka, T Bhan, M Ponnekanti, H Seamons, M Deacon, T Xia, LQ Pham, F Silvetti, D Cheung, D Fairbairn, K Jonhson, A Pearce, R Langan, J

Citation: S. Raoux et al., Remote microwave plasma source for cleaning chemical vapor deposition chambers: Technology for reducing global warming gas emissions, J VAC SCI B, 17(2), 1999, pp. 477-485