Login
|
New Account
AAAAAA
ITA
ENG
Results:
1-3
|
Results: 3
Atomistic simulation of ion implantation and its application in Si technology
Authors:
Posselt, M Schmidt, B Feudel, T Strecker, N
Citation:
M. Posselt et al., Atomistic simulation of ion implantation and its application in Si technology, MAT SCI E B, 71, 2000, pp. 128-136
Boundary-sensitive mesh generation using an offsetting technique
Authors:
Krause, J Strecker, N Fichtner, W
Citation:
J. Krause et al., Boundary-sensitive mesh generation using an offsetting technique, INT J NUM M, 49(1-2), 2000, pp. 51-59
Viscoelastic material behavior: Models and discretization used in process simulator DIOS
Authors:
Pomp, A Zelenka, S Strecker, N Fichtner, W
Citation:
A. Pomp et al., Viscoelastic material behavior: Models and discretization used in process simulator DIOS, IEEE DEVICE, 47(10), 2000, pp. 1999-2007
Risultati:
1-3
|