Authors:
Stuik, R
Louis, E
Yakshin, AE
Gorts, PC
Maas, ELG
Bijkerk, F
Schmitz, D
Scholze, F
Ulm, G
Haidl, M
Citation: R. Stuik et al., Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography, J VAC SCI B, 17(6), 1999, pp. 2998-3002
Authors:
Stuik, R
Shmaenok, LA
Fledderus, H
Andreev, SS
Shamov, EA
Zuev, SY
Salashchenko, NN
Bijkerk, F
Citation: R. Stuik et al., Development of low-energy x-ray fluorescence micro-distribution analysis using a laser plasma x-ray source and multilayer optics?, J ANAL ATOM, 14(3), 1999, pp. 387-390