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Results:
1-7
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Results: 7
Authors:
Sukharev, V
Kumar, K
Li, WD
Zhao, J
Pyka, W
McInerney, EJ
Joh, S
Citation: V. Sukharev et al., Integrated multiscale three-dimensional simulation approach in local interconnect gap-fill optimization, J VAC SCI B, 19(5), 2001, pp. 1879-1893
Authors:
Sukharev, V
Shieh, BP
Choudhury, R
Park, C
Saraswat, KC
Citation: V. Sukharev et al., Reliability studies on multilevel interconnection with intermetal dielectric air gaps, MICROEL REL, 41(9-10), 2001, pp. 1631-1635
Authors:
Sukharev, V
Citation: V. Sukharev, Fluctuation model of chemical mechanical planarization, J ELCHEM SO, 148(3), 2001, pp. G172-G177
Authors:
Zubkov, V
Aronowitz, S
Sukharev, V
Citation: V. Zubkov et al., Atomic level modeling of boron diffusion through silicon oxide before and after plasma nitridation, MAT SC S PR, 3(1-2), 2000, pp. 41-45
Authors:
Abdollahi-Alibeik, S
McVittie, JP
Saraswat, KC
Sukharev, V
Schoenborn, P
Citation: S. Abdollahi-alibeik et al., Analytical modeling of silicon etch process in high density plasma, J VAC SCI A, 17(5), 1999, pp. 2485-2491
Authors:
Sukharev, V
Aronowitz, S
Zubkov, V
Puchner, H
Haywood, J
Kimball, J
Citation: V. Sukharev et al., Plasma-induced nitridation of gate oxide dielectrics: Linked equipment-feature atomic scale simulations, J VAC SCI A, 17(4), 1999, pp. 1356-1363
Authors:
Cavicchi, R
Sukharev, V
Semancik, S
Citation: R. Cavicchi et al., Time-dependent conductance of Pd-dosed SnO2 (110), SURF SCI, 418(3), 1998, pp. L81-L88
Risultati:
1-7
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