Authors: Kukli, K Aarik, J Aidla, A Forsgren, K Sundqvist, J Harsta, A Uustare, T Mandar, H Kiisler, AA

Citation: K. Kukli et al., Atomic layer deposition of tantalum oxide thin films from iodide precursor, CHEM MATER, 13(1), 2001, pp. 122-128