Authors: NALAMASU O REICHMANIS E TIMKO AG TARASCON R NOVEMBRE AE SLATER S HOLZWARTH H FALCIGNO P MUNZEL N

Citation: O. Nalamasu et al., A UNIFIED APPROACH TO RESIST MATERIALS DESIGN FOR THE ADVANCED LITHOGRAPHIC TECHNOLOGIES, Microelectronic engineering, 27(1-4), 1995, pp. 367-370