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Results: 1
COMPARISON OF OXIDATION RATES FOR A-SI1-XCX-H FILMS DEPOSITED FROM PULSED AND CONTINUOUS-WAVE RF PLASMAS
Authors:
MCCURDY PR TRUITT JM FISHER ER
Citation:
Pr. Mccurdy et al., COMPARISON OF OXIDATION RATES FOR A-SI1-XCX-H FILMS DEPOSITED FROM PULSED AND CONTINUOUS-WAVE RF PLASMAS, Journal of the Electrochemical Society, 145(9), 1998, pp. 3271-3277
Risultati:
1-1
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