Authors: Tserepi, A Valamontes, ES Tegou, E Raptis, I Gogolides, E

Citation: A. Tserepi et al., Surface and line-edge roughness in plasma-developed resists, MICROEL ENG, 57-8, 2001, pp. 547-554

Authors: Beltsios, K Athanasiou, E Tegou, E Kanellopoulos, N

Citation: K. Beltsios et al., Phase-inversion applications beyond membrane formation. I. Lithography films, J APPL POLY, 78(12), 2000, pp. 2145-2157

Authors: Tegou, E Gogolides, E Argitis, P Raptis, I Meneghini, G Cui, Z

Citation: E. Tegou et al., Silylation and dry development of chemically amplified resists SAL601(1),AZPN114*(1), and epoxidised resist (EPR*(1)) for high resolution electron-beam lithography, JPN J A P 1, 37(12B), 1998, pp. 6873-6876