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Citation: Sj. Spector et al., Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks, J VAC SCI B, 17(6), 1999, pp. 3003-3008

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Citation: Dm. Tennant et al., Progress toward a 30 nm silicon metal-oxide-semiconductor gate technology, J VAC SCI B, 17(6), 1999, pp. 3158-3163

Authors: Ocola, LE Biddick, CJ Tennant, DM Waskiewicz, WK Novembre, AE

Citation: Le. Ocola et al., Negative chemically amplified resist characterization for direct write andSCALPEL nanolithography, J VAC SCI B, 16(6), 1998, pp. 3705-3708