Authors:
Tessler, LR
Piamonteze, C
Alves, MCM
Tolentino, H
Citation: Lr. Tessler et al., Evolution of the Er environment in a-Si : H under annealing: ion implantation versus co-deposition, J NON-CRYST, 266, 2000, pp. 598-602
Citation: Lr. Tessler et Ac. Iniguez, Optimization of the as-deposited 1.54 mu m photoluminescence intensity in a-SiOx : H < Er >, J NON-CRYST, 266, 2000, pp. 603-607