Authors:
Massalska-Arodz, M
Williams, G
Thomas, DK
Jones, WJ
Dabrowski, R
Citation: M. Massalska-arodz et al., Molecular dynamics and crystallization behavior of chiral isooctyloxycyanobiphenyl as studied by dielectric relaxation spectroscopy, J PHYS CH B, 103(20), 1999, pp. 4197-4205
Authors:
Gregory, RB
Wetteroth, TA
Wilson, SR
Holland, OW
Thomas, DK
Citation: Rb. Gregory et al., Effects of irradiation temperature and dose on exfoliation of H+-implantedsilicon carbide, APPL PHYS L, 75(17), 1999, pp. 2623-2625
Citation: Eg. Roth et al., Control of diffusion of implanted boron in preamorphized Si: Elimination of interstitial defects at the amorphous-crystal interface, APPL PHYS L, 74(5), 1999, pp. 679-681