Authors: Puscasu, I Boreman, G Tiberio, RC Spencer, D Krchnavek, RR

Citation: I. Puscasu et al., Comparison of infrared frequency selective surfaces fabricated by direct-write electron-beam and bilayer nanoimprint lithographies, J VAC SCI B, 18(6), 2000, pp. 3578-3581

Authors: Guillorn, MA Carr, DW Tiberio, RC Greenbaum, E Simpson, ML

Citation: Ma. Guillorn et al., Fabrication of dissimilar metal electrodes with nanometer interelectrode distance for molecular electronic device characterization, J VAC SCI B, 18(3), 2000, pp. 1177-1181

Authors: Ainley, E Nordquist, K Resnick, DJ Carr, DW Tiberio, RC

Citation: E. Ainley et al., Process optimization of a chemically amplified negative resist for electron beam exposure and mask making applications, MICROEL ENG, 46(1-4), 1999, pp. 375-378

Authors: Tiberio, RC Carr, DW Rooks, MJ Mihailov, SJ Bilodeau, F Albert, J Stryckman, D Johnson, DC Hill, KO McClelland, AW Hughes, BJ

Citation: Rc. Tiberio et al., Fabrication of electron beam generated, chirped, phase mask (1070.11-1070.66 nm) for fiber Bragg grating dispersion compensator, J VAC SCI B, 16(6), 1998, pp. 3237-3240

Authors: Ruchhoeft, P Wolfe, JC Wasson, J Torres, J Wu, H Nounu, H Liu, N Herbordt, M Morgan, MD Tiberio, RC

Citation: P. Ruchhoeft et al., Fabrication of silicon stencil masks with vitreous carbon ion-absorbing coatings, J VAC SCI B, 16(6), 1998, pp. 3599-3601