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Results:
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Results: 3
Environmental stability of 193 nm single layer chemically amplified resists
Authors:
Timko, AG Houlihan, FM Cirelli, RA Nalamasu, O Yoshino, H Itani, T Tanabe, H Kasama, K
Citation:
Ag. Timko et al., Environmental stability of 193 nm single layer chemically amplified resists, J VAC SCI B, 17(1), 1999, pp. 101-108
Environmental stability of 193-nm single layer chemically amplified resists
Authors:
Yoshino, H Timko, AG Itani, T Tanabe, H Houlihan, FM Nalamasu, O
Citation:
H. Yoshino et al., Environmental stability of 193-nm single layer chemically amplified resists, NEC RES DEV, 40(3), 1999, pp. 345-349
193 nm single layer resist strategies, concepts, and recent results
Authors:
Nalamasu, O Houlihan, FM Cirelli, RA Timko, AG Watson, GP Hutton, RS Kometani, JM Reichmanis, E Gabor, A Medina, A Slater, S
Citation:
O. Nalamasu et al., 193 nm single layer resist strategies, concepts, and recent results, J VAC SCI B, 16(6), 1998, pp. 3716-3721
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