Authors:
Mannino, G
Stolk, PA
Cowern, NEB
de Boer, WB
Dirks, AG
Roozeboom, F
van Berkum, JGM
Woerlee, PH
Toan, NN
Citation: G. Mannino et al., Effect of heating ramp rates on transient enhanced diffusion in ion-implanted silicon, APPL PHYS L, 78(7), 2001, pp. 889-891