Authors: Hidalgo, H Tristant, P Denoirjean, A Desmaison, J

Citation: H. Hidalgo et al., Microwave plasma enhanced CVD of aluminum oxide films: Influence of the deposition parameter on the films characteristics, J PHYS IV, 11(PR3), 2001, pp. 723-730

Authors: Tristant, P Desmaison, J Naudin, F Merle, D

Citation: P. Tristant et al., RMPECVD of silica films with a high microwave power (1600 W) parametric studies, J PHYS IV, 11(PR3), 2001, pp. 771-778

Authors: Tristant, P Ding, Z Vinh, QBT Hidalgo, H Jauberteau, JL Desmaison, J Dong, C

Citation: P. Tristant et al., Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics andinfluence of the RF bias, THIN SOL FI, 390(1-2), 2001, pp. 51-58

Authors: Lefort, P Maitre, A Tristant, P

Citation: P. Lefort et al., Influence of the grain size on the reactivity of TiO2/C mixtures, J ALLOY COM, 302(1-2), 2000, pp. 287-298

Authors: Naudin, F Tristant, P Hugon, MC Jauberteau, I Agius, B Desmaison, J

Citation: F. Naudin et al., RMPECVD of silica films in large scale microwave plasma reactor: Films properties, J PHYS IV, 9(P8), 1999, pp. 819-826

Authors: Ntsama-Etoundi, MC Desmaison, J Tristant, P Tixier, C

Citation: Mc. Ntsama-etoundi et al., Remote microwave plasma enhanced chemical vapour deposition of alumina on metallic substrates, SURF COAT, 121, 1999, pp. 233-237