Authors:
Liu, PT
Chang, TC
Yang, YL
Cheng, YF
Lee, JK
Shih, FY
Tsai, E
Chen, G
Sze, SM
Citation: Pt. Liu et al., Improvement on intrinsic electrical properties of low-k hydrogen silsesquioxane/copper interconnects employing deuterium plasma treatment, J ELCHEM SO, 147(3), 2000, pp. 1186-1192
Authors:
Liu, PT
Chang, TC
Yang, YL
Cheng, YF
Shih, FY
Lee, JK
Tsai, E
Sze, SM
Citation: Pt. Liu et al., Effectively blocking copper diffusion at low-k hydrogen silsesquioxane/copper interface, JPN J A P 1, 38(11), 1999, pp. 6247-6252