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Results: 1-14 |
Results: 14

Authors: Hatakeyama, M Nomura, A Oishi, K Tsujita, K Suzuki, Y Ueno, I
Citation: M. Hatakeyama et al., Thermochromic super-resolution in phase-change rewritable disk with doublemask layer, JPN J A P 1, 40(3B), 2001, pp. 1645-1646

Authors: Tsuchiya, K Nishiyama, T Tsujita, K
Citation: K. Tsuchiya et al., A deterministic annealing algorithm for a combinatorial optimization problem using replicator equations, PHYSICA D, 149(3), 2001, pp. 161-173

Authors: Ogawa, H Mizuno, Y Ohkawara, S Tsujita, K Ando, Y Yoshinaga, M Yasue, H
Citation: H. Ogawa et al., Cardiac amyloidosis presenting as microvascular angina - A case report, ANGIOLOGY, 52(4), 2001, pp. 273-278

Authors: Hatakeyama, M Ando, T Tsujita, K Oishi, K Ueno, I
Citation: M. Hatakeyama et al., Super-resolution rewritable optical disk having a mask layer composed of thermo-chromic organic dye, JPN J A P 1, 39(2B), 2000, pp. 752-755

Authors: Hiraga, T Chen, GR Tsujita, K Tanaka, N Chen, QY Moriya, T
Citation: T. Hiraga et al., A novel formation method of thin polymer film with densely dispersed organic dye by using vacuum technique, MOLEC CRYST, 344, 2000, pp. 211

Authors: Nakao, S Nakae, A Yamaguchi, A Tsujita, K Wakamiya, W
Citation: S. Nakao et al., 0.10 mu m dense hole pattern formation by double exposure utilizing alternating phase shift mask using KrF excimer laser as exposure light, JPN J A P 1, 38(5A), 1999, pp. 2686-2693

Authors: Nakao, S Nakae, A Tsujita, K Wakamiya, W
Citation: S. Nakao et al., Impact of spherical aberrations on printing characteristics of irregularlyaligned patterns of alternating phase shift mask, JPN J A P 1, 38(4A), 1999, pp. 1919-1926

Authors: Kishimura, S Kimura, Y Sakai, J Tsujita, K Matsui, Y
Citation: S. Kishimura et al., Improvement of dry etching resistance of resists by deep UV cure, JPN J A P 1, 38(1A), 1999, pp. 250-255

Authors: Nakao, S Tsujita, K Arimoto, I Wakamiya, W
Citation: S. Nakao et al., Imaging characteristics of 0.12 mu m dynamic random access memory pattern by KrF excimer laser lithography, JPN J A P 1, 38(12B), 1999, pp. 6985-6993

Authors: Nakao, S Tsujita, K Wakamiya, W
Citation: S. Nakao et al., Quantitative measurement of the ray shift aspect of coma aberration utilizing electrical probe with zero-crossing method, JPN J A P 1, 37(12B), 1998, pp. 6698-6702

Authors: Nakao, S Miyazaki, J Tsujita, K Wakamiya, W
Citation: S. Nakao et al., Measurement method for odd component of aberration function utilizing alternating phase shift mask, JPN J A P 1, 37(12B), 1998, pp. 6709-6713

Authors: Nakao, S Mastubara, H Yamaguchi, A Sakai, J Nakae, A Tatsu, S Tsujita, K Wakamiya, W
Citation: S. Nakao et al., Simple method for resist critical dimension prediction, JPN J A P 1, 37(12B), 1998, pp. 6855-6862

Authors: Nakao, S Nakae, A Sakai, J Miura, T Tatsu, S Tsujita, K Wakamiya, W
Citation: S. Nakao et al., Measurement of spherical aberration utilizing an alternating phase shift mask, JPN J A P 1, 37(11), 1998, pp. 5949-5955

Authors: Kanazawa, T Minamimura, Y Kumakura, S Tozaki, Y Abe, K Tsujita, K Shiozaki, T
Citation: T. Kanazawa et al., Quality strip production with a high speed medium thick slab caster, REV METALL, 95(11), 1998, pp. 1429-1434
Risultati: 1-14 |