Authors:
Hatakeyama, M
Nomura, A
Oishi, K
Tsujita, K
Suzuki, Y
Ueno, I
Citation: M. Hatakeyama et al., Thermochromic super-resolution in phase-change rewritable disk with doublemask layer, JPN J A P 1, 40(3B), 2001, pp. 1645-1646
Citation: K. Tsuchiya et al., A deterministic annealing algorithm for a combinatorial optimization problem using replicator equations, PHYSICA D, 149(3), 2001, pp. 161-173
Authors:
Hatakeyama, M
Ando, T
Tsujita, K
Oishi, K
Ueno, I
Citation: M. Hatakeyama et al., Super-resolution rewritable optical disk having a mask layer composed of thermo-chromic organic dye, JPN J A P 1, 39(2B), 2000, pp. 752-755
Authors:
Hiraga, T
Chen, GR
Tsujita, K
Tanaka, N
Chen, QY
Moriya, T
Citation: T. Hiraga et al., A novel formation method of thin polymer film with densely dispersed organic dye by using vacuum technique, MOLEC CRYST, 344, 2000, pp. 211
Authors:
Nakao, S
Nakae, A
Yamaguchi, A
Tsujita, K
Wakamiya, W
Citation: S. Nakao et al., 0.10 mu m dense hole pattern formation by double exposure utilizing alternating phase shift mask using KrF excimer laser as exposure light, JPN J A P 1, 38(5A), 1999, pp. 2686-2693
Citation: S. Nakao et al., Impact of spherical aberrations on printing characteristics of irregularlyaligned patterns of alternating phase shift mask, JPN J A P 1, 38(4A), 1999, pp. 1919-1926
Authors:
Nakao, S
Tsujita, K
Arimoto, I
Wakamiya, W
Citation: S. Nakao et al., Imaging characteristics of 0.12 mu m dynamic random access memory pattern by KrF excimer laser lithography, JPN J A P 1, 38(12B), 1999, pp. 6985-6993
Citation: S. Nakao et al., Quantitative measurement of the ray shift aspect of coma aberration utilizing electrical probe with zero-crossing method, JPN J A P 1, 37(12B), 1998, pp. 6698-6702
Authors:
Nakao, S
Miyazaki, J
Tsujita, K
Wakamiya, W
Citation: S. Nakao et al., Measurement method for odd component of aberration function utilizing alternating phase shift mask, JPN J A P 1, 37(12B), 1998, pp. 6709-6713