Authors: Smith, RC Ma, TZ Hoilien, N Tsung, LY Bevan, MJ Colombo, L Roberts, J Campbell, SA Gladfelter, WL

Citation: Rc. Smith et al., Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of hafnium dioxide, ADV MAT OPT, 10(3-5), 2000, pp. 105-114