Authors: Steffen, H Wulff, H Quaas, M Tun, TM Hipple, R

Citation: H. Steffen et al., Diffusion and crystal growth in plasma deposited thin ITO films, ACT PHYS SL, 50(6), 2000, pp. 667-672

Authors: Quade, A Wulff, H Steffen, H Tun, TM Hippler, R

Citation: A. Quade et al., Investigation of the aluminium oxidation in an oxygen plasma excited by microwaves, THIN SOL FI, 377, 2000, pp. 626-630