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Results: 1-2 |
Results: 2
Suppression of plasma charging damage in sub-micron metal-oxide-semiconductor field-effect transistors (MOSFETs) with gate oxynitride by two-step nitridation
Authors: Tzeng, PJ Wu, BF Chang-Liao, KS
Citation: Pj. Tzeng et al., Suppression of plasma charging damage in sub-micron metal-oxide-semiconductor field-effect transistors (MOSFETs) with gate oxynitride by two-step nitridation, JPN J A P 2, 40(6A), 2001, pp. L536-L538
Plasma charging damage on MOS devices with gate insulator of high-dielectric constant material
Authors: Tzeng, PJ Chang, YY Chang-Liao, KS
Citation: Pj. Tzeng et al., Plasma charging damage on MOS devices with gate insulator of high-dielectric constant material, IEEE ELEC D, 22(11), 2001, pp. 527-529
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